Monolithic, Crystalline MOF Coating: An Excellent Patterning and Photoresist Material

  • Author:

    Z. Wang, J. Liu, S. Grosjean, D. Wagner, W. Guo, Z.-G. Gu, L. Heinke, H. Gliemann, S. Bräse, C. Wöll
  • Source:

    ChemNanoMat 2015, 1, 338-345.

  • Date: 2015
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